Gas mass flow controller(MFC)

  • Flow range

    0.5SCCM~20SLPM
  • Accuracy

    ±0.5~1.0%S.P.
  • Pressure

    5kPaA-2MPaA
  • Gas temperature

    -50 ℃~80 ℃
Gas mass flow controller(MFC)

Specifications

ModelTC100
TC300TC450
Flow range20SCCM~20SLPM0.5SCCM~20SLPM2SCCM~20SLPM

Accuracy

±1.0%F.S. (2%~100% F.S.)

±1.0%S.P.(20%~100%F.S.)
 ±0.2%F.S.(0.5%~20%F.S.)

±0.5%S.P.(20%~100%F.S.)
±0.1%F.S.(0.5%~20%F.S.)

Repeatability±0.2%F.S.

±0.2%S.P.(20%~100%F.S.)
 ±0.04%F.S.(0.5%~20%F.S.)

±0.1%S.P.(20%~100%F.S.)
  ±0.02%F.S.(0.5%~20%F.S.)

Pressure shift

≤±0.1%F.S./100kPa(Benchmark 100kPaA)

≤±0.1%S.P./100kPa(Benchmark 100kPaA)

Temperature shift

≤±0.05%F.S./℃(Benchmark 25℃)≤±0.02%F.S./℃(Benchmark 25℃)
Zero shift±0.2%F.S.±0.1%F.S.
Operating range2%~100%F.S.1%~100%F.S.0.5%~100%F.S.
Response time≤800ms≤600ms
Warm-up time≤1s
Gas temperature0℃~50℃-20℃~60℃
Valve function

Normally closed

Proof pressure1.5 MPaA
Max pressure900kPaA
Leak rate≤1×10-10 Pa·m³/s He
Power supply voltage24VDC(±20%)
Current consumption<150mA(<3.6W)
Mounting orientation sensitivityNone
Process connectorsG thread、VCR、Swagelok、IGS
Wetted materialsSUS316L、FKM、FFKM、EPDM、Neoprene
SealingRubber ring seal:FKM、FFKM、EPDM、Neoprene
CommunicationRS485、4~20mA / 0~5V


Gas mass flow controller(MFC)

Application scenarios

semiconductor equipment

Biological processing system

Analytical Instrument

Leakage test of fuel cell stack

reactive sputtering

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