Gas mass flow controller(MFC)

  • Flow range

    0.5SCCM~5000SLPM
  • Accuracy

    ±0.5~1.0%S.P.
  • Pressure

    5kPaA-2MPaA
  • Gas temperature

    -50℃~80℃
Gas mass flow controller(MFC)

Specifications

ModelEC100
EC200EC300EC400EC450
Flow range20SCCM~500SLPM10SCCM~500SLPM0.5SCCM~5000SLPM2SCCM~2000SLPM2SCCM~2000SLPM

Accuracy

±1.0%F.S. (2%~100% F.S.)

±1.0%S.P.(30%~±100%F.S.) ±0.3%F.S.(1%~30%F.S.)

±1.0%S.P.(20%~100%F.S.
 ±0.2%F.S.(0.5%~20%F.S.)

±1.0%S.P.(10%~100%F.S.)
±0.1%F.S.(0.5%~10%F.S.)

±0.5%S.P.(20%~100%F.S.)
±0.1%F.S.(0.5%~20%F.S.)

Repeatability±0.2%F.S.

±0.2%Rd(20%~100%F.S.
 ±0.04%F.S.(0.5%~20%F.S.)

±0.1%Rd(20%~100%F.S.)
  ±0.02%F.S.(0.5%~20%F.S.)

Pressure shift

≤±0.1%F.S./100kPa(Benchmark 100kPaA)

≤±0.1%Rd/100kPa(Benchmark 100kPaA)

Pressure shift

≤±0.05%F.S./℃(Benchmark 25℃)≤±0.02%F.S./℃(Benchmark 25℃)
Zero shift±0.2%F.S.±0.1%F.S.
Operating range2%~100%F.S.1%~100%F.S.0.5%~100%F.S.
Response time≤800ms≤600ms
Warm-up time≤1s
Gas temperature0℃~50℃-20℃~60℃
Ambient temperature0℃~50℃-20℃~60℃
Pressure drop

50kPa(≤5SLPM);100kPa(10SLPM);50kPa(20SLPM);
200kPa(30~200SLPM); 300kPa(500~1000SLPM);400kPa(1500~2000SLPM);450kPa(3000~5000SLPM)

Proof pressure1.5 MPaA
Max pressure600kPaA900kPaA
Leak rate≤1×10-10 Pa·m³/s He
Power supply voltage24VDC(±20%)
Mounting orientation sensitivityNone
Process connectorsG thread、VCR、Swagelok、IGS
Wetted materialsSUS316L、FKM、FFKM、EPDM、Neoprene
SealingRubber ring seal:FKM、FFKM、EPDM、Neoprene
CommunicationRS485、PROFIBUS、EtherCAT,PROFINET,DeviceNet、4~20mA / 0~5V


Gas mass flow controller(MFC)

Application scenarios

semiconductor equipment

Hydrogen energy and fuel cell technology

Gas control of biological fermentation tanks

Burner control

Vacuum heat treatment equipment

Preparation of new materials such as silicon carbon negative electrode

vacuum coating equipment

For other customized products, please consult Yidu

Pre sales and after-sales engineer:400-881-5356

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